Flexible High-Adhesion Base Extreme Base by Monika Mielniczuk MollyLac, 10g. Extreme Base is a self-leveling, flexible product with an innovative formula. Thanks to stronger bonds, it provides maximum adhesion to the nail surface. Created by the exceptional nail specialist Monika Mielniczuk for extreme and particularly demanding designs, including problematic nails.

Experience and knowledge have allowed the creation of a unique, multi-layer product with at least many applications. With this base, you will eliminate the problem of air bubbles under the nails.

Product features:

• excellent adhesion
• easy and quick application
• can be applied evenly/correct imperfections
• does not flood the cuticles
• fills surface imperfections of the nail
• ideal for hybrid, gel, and acrylic systems
• perfect for hard natural nails
• creates strong covalent bonds with the nail surface
• can be applied without primer
• allows double application
• does not cause air bubbles during application
• not the thinnest layer offers maximum adhesion
• wonderfully designed brush that prevents overflow of the cuticles
• durable even in extreme conditions
• ideal for difficult cases (wet, problematic nail surface)
• removable with soak-off method
• ideal for men's manicure
• perfect for fast manicure
• innovative Control Curing formula (no burning sensation during curing under lamp)
• resistant to yellowing
• LED/UV formula

Directions for use:

Apply a small amount of base to the prepared nail surface. Cure for 10 seconds under LED and 30 seconds under UV. The base can be applied and used to balance imperfections on the nail surface.

Dosage: 10 g

Ingredients/INCI: Hydroxyethyl Acrylate/IPDI/PPG-15 Glyceryl Ether Copolymer, HEMA, Bis-HEA Polycaprolactone/SMDI Copolymer, Aliphatic Urethane Methacrylate, Ethyl Trimethylbenzoyl Phenylphosphinate, Benzoyl Isopropanol, Bis(T-Butyl Benzoxazolyl) Thiophene, MEK, CI 60725

Warnings:

• For professional use only.
• Keep out of reach of children.
• May cause allergic reactions.
• Read instructions carefully.